CAIRO: Intel Corporation showcased its latest family of processors for the first time in Cairo on Sunday.
The newly unveiled 16 server and high-end PC processors are built using a new transistor formula that alleviates the wasteful electricity leaks that threaten the pace of future computer innovation. In addition to increasing computer performance and saving energy use, these processors also eliminate eco-unfriendly lead and, in 2008, halogen materials.
Called the biggest transistor advancements in 40 years by Intel Co-Founder Gordon Moore, the processors are the first to use Intel’s Hafnium-based high-k metal gate (Hi-k) formula for transistors inside these processors. These Intel Core 2 Extreme and Xeon processors are also the first to be manufactured on the company’s 45-nanometer (nm) manufacturing process, further boosting performance and lowering power consumption.
This would enable Intel to design products that are 25 percent smaller than previous versions and, making them more cost-effective, as well as the ability next year to pursue new ultra mobile and consumer electronics “system on chip opportunities.
“This feat, coupled with our industry-leading architectures, means faster and sleeker computers, longer battery life and better energy efficiency, said Khaled Elamrawi, Intel country manager for Egypt, Levant and North Africa. “Our objective is to bring consumers a new class of computers delivering a full Internet experience in ever-smaller, more portable form factors.
The new 45nm (a nanometer is 1 billionth of a meter) processors boast nearly twice the transistor density of previous chips built on the company’s 65nm technology – that is up to 820 million transistors for quad-core processors, each using Intel’s new formula.
